01783nas a2200133   4500008004100000022001400041245010000055210006900155260000700224300001100231490000700242520136200249856003801611       2025                        eng d  a2166-274600aCompact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring0 aCompact vacuum setup for laser induced plasma etching with optic  c04  a0342020 v433 a<p>Reactive ion etching and reactive ion beam etching are widely used processes in the semiconductor industry but face challenges due to their high cost, energy demands, and maintenance complexity. Femtosecond laser micromachining has emerged as a versatile and precise method for microfabrication, but it often results in suboptimal surface quality, which requires postprocessing. Laser-induced plasma etching (LIPE) presents a promising solution, achieving low surface roughness and efficient material removal rates. Here, we investigate the LIPE process by utilizing a femtosecond laser setup with optimized optical components and a custom-designed compact vacuum chamber, enabling precise control and monitoring of the reactive gas environment for plasma generation and etching. The effects of numerical aperture, working distance, and laser energy thresholds on plasma ignition and plume formation were examined. Preliminary results demonstrate plasma ignition in air and SF6 gas with laser pulse energy thresholds between 15 and 20 μJ using a 10× magnification microscope objective. The spectral analysis of the plasma generated in the SF6 gas provides insights into plasma dynamics and enables real-time process monitoring. This work establishes foundational parameters for optimizing LIPE setups and advancing precision etching applications.</p>  uhttps://doi.org/10.1116/6.000429601184nas a2200121   4500008004100000022001400041245008800055210006900143300000800212490000700220520079100227856004401018       2025                        eng d  a2310-286100aImpact of Collagen on the Rheological and Transport Properties of Agarose Hydrogels0 aImpact of Collagen on the Rheological and Transport Properties o  a3960 v113 a<p>This work investigated how collagen addition affects the rheological and transport properties of agarose hydrogels. Collagen did not affect the rheological character of hydrogels (i.e., the overall shape of amplitude and frequency response curves) but changed their viscoelastic moduli and mesh size dependent on the concentration of both constituents. The diffusion coefficients of the oppositely charged model dyes eosin B and methylene blue were determined in all hydrogels and demonstrated a profound effect of electrostatic interactions. Comparison with similar work with fibroin addition showed that while the effects of these proteins on the viscoelastic properties of a polysaccharide network can be similar, their impact on network transport properties may be different.</p>  uhttps://www.mdpi.com/2310-2861/11/6/39600260nas a2200073   4500008004100000245005300041210005300094856003900147       2024                        eng d00aDesign of Setup for Laser Induced Plasma Etching0 aDesign of Setup for Laser Induced Plasma Etching  uhttp://www.isibrno.cz/en/node/3997