00423nas a2200109   4500008004100000022002500041245009700066210006900163300001600232490000700248856005800255       2026                        eng d  a1530-6984, 1530-699200aOptomechanical Probes with Tailored Material and Shape Asymmetry Assembled Using DNA Origami0 aOptomechanical Probes with Tailored Material and Shape Asymmetry  a2080–20880 v26  uhttps://pubs.acs.org/doi/10.1021/acs.nanolett.5c0535401783nas a2200133   4500008004100000022001400041245010000055210006900155260000700224300001100231490000700242520136200249856003801611       2025                        eng d  a2166-274600aCompact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring0 aCompact vacuum setup for laser induced plasma etching with optic  c04  a0342020 v433 a<p>Reactive ion etching and reactive ion beam etching are widely used processes in the semiconductor industry but face challenges due to their high cost, energy demands, and maintenance complexity. Femtosecond laser micromachining has emerged as a versatile and precise method for microfabrication, but it often results in suboptimal surface quality, which requires postprocessing. Laser-induced plasma etching (LIPE) presents a promising solution, achieving low surface roughness and efficient material removal rates. Here, we investigate the LIPE process by utilizing a femtosecond laser setup with optimized optical components and a custom-designed compact vacuum chamber, enabling precise control and monitoring of the reactive gas environment for plasma generation and etching. The effects of numerical aperture, working distance, and laser energy thresholds on plasma ignition and plume formation were examined. Preliminary results demonstrate plasma ignition in air and SF6 gas with laser pulse energy thresholds between 15 and 20 μJ using a 10× magnification microscope objective. The spectral analysis of the plasma generated in the SF6 gas provides insights into plasma dynamics and enables real-time process monitoring. This work establishes foundational parameters for optimizing LIPE setups and advancing precision etching applications.</p>  uhttps://doi.org/10.1116/6.000429600260nas a2200073   4500008004100000245005300041210005300094856003900147       2024                        eng d00aDesign of Setup for Laser Induced Plasma Etching0 aDesign of Setup for Laser Induced Plasma Etching  uhttp://www.isibrno.cz/en/node/3997